Negotiable
The date of payment from buyers deliver within days
Guangdong
Long-term effective
2017-09-01 16:23
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Company Profile
By certification [File Integrity]
Contact：Mr. Minder Hu(Mr.)
Email：
Telephone：
Phone：
Area：Guangdong
Address：Guangdong
Website： http://minder-hightech.artstx.com/
MD-SB-402 Mask Aligner is mainly designed for double aligning and exposure process of photoelectric device, power device, sensors, hybrid circuits, micro wave device and MEMS etc.
Main Features:
Alignment:Double layer thin three-dimensional alignment stage with high precision by V-linear guideway and θ-direction thin bearing, center slippery piece, high linearity and rotating precision.
Mechanical arm: Linear guideway and Ball screw, high positioning precision and repeatability.
Top mask system: THK adjusted separation linear guideway is adopted for the up-down guideway of top mask, the digital micrometer with high resolution is used for driver, high positioning precision and repeatability.
Align view system: Clear obtained by horizontal split field microscope with symmetrical double light route
Electric control system: Convenient operation and steady performance achieved by PLC and Touchscreen control, running status display and much testing function
Exposure system: Top and bottom unattached exposure system with advanced structure, providing high light intensity, uniformity and optical resolution
Main Specifications:
Alignment stage parameters:
X-axis: ±4mm
Y-axis: ±4mm
θ-direction: ±5°
Size of wafer : φ4″
Size of mask : 5″×5″
Precision of double-sides aligning: ±0.003mm
Mechanical arm system parameters:
Gap of mechanical arm from lower mask:
0~100μm(Min increment:1μm)
Exposure system parameters:
Illumination: 250W high pressure mercury vapor lamp
Wavelength: UV365
Max exposure area: φ110mm
Non-uniformity:±3%
Printing resolution: 3μm (plus photoresist)
Cooling of mercury vapor lamp: wind
Exposure time: 0~999s(Min increment:1s)
Split view field microscope parameters:
Magnification: 65X
View field: φ3.3mm
Separation between objectives: 26~70mm
Facilities:
Voltage: ~220V±22V(50HZ)
Power consumption: 1.5KW
Light: Red or yellow
N2 pressure: 0.2~0.4MPa
Air pressure: 0.5~0.7MPa
Vacuum: -0.08~-0.1mPa
Dimensions & Weight:
Weight: 480KG
Overall Dimensions: 950mm×850mm×1500mm
Comprason table:
Model: |
Mask Size |
Wafer Size |
Exposure Type |
Manual /Automatic |
Application has been in |
MD-BG-401A |
5inch |
4inch |
Single side |
manual |
Small or middle IC,SAW,other |
MD-SB-402 |
5inch |
4inch |
Dual side |
manual |
Photoelectric/power device,sensors,hybrid circuits,MEMS etc. |
MD-BG-403D |
5inch |
4inch |
Dual side |
manual |
GPP diode,power device,others. |
MD-BG-403S |
5inch |
4inch |
Single side |
manual |
|
MD-BG-406 |
7inch |
6inch |
Single/double |
manual |
IC.GPP,LED,MEMS,others |
MD-BG-407 |
5inch |
2/3/4 inch |
Single side |
automatic |
LED,Diode,triode,etc. |
MD-BG-601A |
7inch |
6inch |
Single/double |
manual |
Power,sensor,photoelectron devise,etc. |
MD-BG-602B/C BX |
7inch |
6inch |
Single/double |
manual |
|
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Guangzhou minder-hightech co., ltd www.minder-hightech.com
No.1 Xingya 3 Road, panyu district, guangzhou, China
Shunyu Hu 0086-15813334038
Cell phone:0086-15813334038
