Automatic Mask Aligner Exposure Machine MD-Bg-407

The MD-BG-407 Automatic mask aligner produced by the 45th research institute could fully satisfy the manufacture on LED chip, diode, triode and other device. It could realize automatic carrying, aligning, exposure of substrate and be provided with high automatization and efficiency.

Main Feature:
Alignment worktable
The alignment worktable is made up of X,Y,θ and Z direction precise electromotion mechanism. It realizes gap leveling and exposure, vacuum printing in contact mode and has the device of preventing falling off of mask.

Exposure system

Composing feedback loop by photosensor of inspecting light intensity in exposure system and mercury lamp power supply to insure constant light power in the course of working.

Aligning microscope
Aligning microscope is split view field microscope provided with image display by CCD and motor-driven focusing. It is switched between front and back by moving the whole body to locate exposure position.

Prealignment system
Prealignment system carries non-contact measurement by using photoelectric sensor and realizes the precision adjustment of scrap edge and the center of the substrate. It improves the efficiency of automatic aligning system and the whole equipment by making the substrate at prealignment accuracy.

Substrate transfers system
The planar movement configuration of the substrate transfers system has three planar shovels divided into two teams to realize substrate's horizontal parallel transfer in straight and it improves the efficiency of equipment.

Up-and-down system of cassette system
Up-and-down system of cassette is driven by individual motor. The existence of cassette and substrate is tested by sensors, which improves the reliability of substrate transfer.

Control system
The whole equipment is controlled by the industry PC. It's manipulated by touch screen and key-press and provided with the functions of marker searching out of field view, automatic aligning, technics document management, running record management etc.

Main Specification:
Alignment travel
X-axis: ±5mm Y-axis:±5mm
Z X-axis:25mm θY-axis:±15°
Size of mask: 5″×5″
Size of wafer: φ2″,φ3″,φ4″
Exposure mode: hard , vacuum
contact and proximity exposure
Microscopes
Total magnification: 90X
Separation between objective :35~100mm
Automatic aligning precision :±1um
Exposure Resolution: 
1μm(positive photoresist, vacuum print);
4μm(20um proximity exposure)
Non-uniformity of Exposure
±2% (Max Exposure area: φ108mm)
Collimation:±2°
Efficiency: 120 pieces/h(contact leveling,first exposure,exposure time:3s)
Facilities:
Voltage: ~220v±22v(50Hz)
Power consumption: 1KW
Light: Red or yellow
Air pressure: 0.5~0.7MPa
N2 pressure: 0.2~0.4MPa
Vacuum: -0.08~-0.14MPa
Dimensions&Weight:
Overall Dimensions:1400mm×1300mm×2300mm
weight: 1000kg

Comprason table:

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Guangzhou minder-hightech co., ltd www.minder-hightech.com

No.1 Xingya 3 Road, panyu district, guangzhou, China

 
cell phone 0086-15813334038